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Nanoparticle deposition with diffusion, impaction or filtration accessories

 

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Prepare your ideal sample in three easy steps


Diffusion

This accessory provides the possibility to homogeneously deposit 0-10 nm particles using Brownian diffusion on TEM grids, in-situ TEM chips, various other MEMS chips and SiOx surfaces. The maximum surface area is 1 cmwith a surface coverage of 0-10% depending on sample preparation time (typically 5-15 minutes). 

Works with: TEM grids, in-situ TEM/MEMS, SiOx
Applications: In-situ TEM catalyst research, materials science, ...
Materials: Metals, Oxides, Alloys, Semiconductors, Carbon*
Max sample size: 1 cm2

Samples made with the diffusion accessory


Impaction

This accessory provides the possibility to deposit nanostructured materials TEM grids, in-situ TEM chips, various other MEMS chips and SiOx surfaces. The maximum functionalized surface area is around 1 mm2. Preparation time for a typical sample is between 1 and 5 minutes.

Works with: TEM grids, in-situ TEM/MEMS, SiOx
Applications: catalysis, in-situ TEM, sensors, batteries
Materials: Metals, Oxides, Alloys, Semiconductors, Carbon*
Max functionalized surface area: around 1 mm2

Samples made with the impaction accessory


Filtration

This accessory provides the possibility to deposit the smallest particles and particle agglomerates on filter membranes, for the development of active surfaces. E.g. to decorate a carbon mesh support with 0-10 nm catalyst particles or to capture particles produced by the G1 (mg/h) in a membrane filter. Max filter diameter is 47 mm.

Works with: Filters, active carbon membranes, nanospun wires
Applications: catalysis, batteries, filter testing
Materials: Metals, Oxides, Alloys, Semiconductors, Carbon*
Max filter diameter: 47 mm

Samples made with the filtration accessory


Combine with the VSP-G1

 The accessories can easily be mounted on the VSP-G1 and enable you to deposit directly on MEMS chips, flat substrates, filters or powders. 

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