VSP- A Series


The VSP-A Series accessories can be easily connected to the output of the VSP-G1, enabling any researcher to produce nanoparticle samples in a matter of hours, with minimal effort.

Easy & quick sample preparation


Typical sample preparation time is 1-60 minutes. Go from hypothesis to result in the same day. With VSPARTICLE Accessories pure nanoparticles are generated and deposited on any kind of substrate.

With VSPARTICLE Accessories pure nanoparticles are generated and deposited on any kind of substrate. You can make a sample with dispersed particles, a nanoporous layer or coated filters with great material flexibility. You can use any kind of (semi)conductive source material: pure, alloys, compacted alloys, mixed materials, oxides and other combinations. 



The spark ablation process used inside the devices is a purely physical process that only requires electricity, a carrier gas and electrode material to produce clean nanoparticles. No additional chemicals are required for the production or to stabilize the particles in the aerosol. The produced nanoparticles can be directly incorporated into the next process step or applied in a product by, for example, impaction, electrostatic precipitation or filtering. This way the unique physical properties of the nanoparticles are directly available in the product. The carrier gas can simply be recirculated, minimizing the environmental impact of the process.

VSP-A1 Diffusion Accessory

For well-dispersed nanoparticles on 2D substrates

  • Dispersed, unagglomerated particles
  • Sample ready in 1-10 minutes
  • From hypothesis to particle sample in less than one hour
  • Sample size 10x10 mm
  • Substrate types: e.g. (in-situ) TEM chips, Electrodes, (doped) Si chips
  • Production rate: 1-10 mg per hour
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VSP-A2 Filtration Accessory

High coverage on porous substrates

  • Mix & match oxides and metallic nanoparticles
  • Collect particles with in-line filter
  • Bottom-up catalyst fabrication
  • Type of substrates: porous membranes, electrospun wires, carbon cloth
  • substrate size ø47 mm
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VSP-A3 Impaction Accessory

Deposition of multiple layers of nanoparticles

  • Grow a nanoporous oxide layer
  • Useful as catalyst support/sensitive material
  • Type of substrates: glass, Si, TEM grids, MEMS chips etc
  • Max. deposited area: ø3 mm
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VSP-A Application Examples

In situ TEM studies: Au on C preparation

Sample preparation

  • Depoistion time: 30 min
  • Substrate: TEM grid
  • Material: Au electrodes
  • Clean, surfactant-free  nanoparticles

Au/Al2O3 on electrospun wires

Three easy steps

  1. Load substrate (electrospun wires)
  2. Deposition of support (AlOx)
  3. Deposition of metal (Au)


Example to be updated..


If you wish to set it up in your own lab, you can opt for buying the nanoparticle generator. It is also possible to work in our lab or let vsparticle provide you with some test samples. Just contact our sales team or complete the contact form to see which option fits your situation and research best. 

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